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Optimum field-size strategy for DRAM mass production in low-k1 process

Author(s):
Park,C.-H. ( Hyundai Electronics Industries Co., Ltd. )
Yim,D.
Lee,S.-H.
Yang,H.-J.
Choi,J.-H.
Shin,Y.-C.
Kim,C.-D.
Choi,J.-S.
Kang,K.-O.
Kim,S.-W.
Lee,D.-D.
Yoon,G.-H.
7 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
Two of Two Parts
Page(from):
1011
Page(to):
1019
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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