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Photoresist thickness variation due to local and global topography

Author(s):
Kim,J.-Y. ( Hanyang Univ. )
Bak,H.-J.
Sohn,Y.-S.
An,I.
Bang,K.-Y.M.
Oh,H.-K.
Han,W.-S.
2 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
Two of Two Parts
Page(from):
982
Page(to):
993
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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