Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
- Author(s):
Lee,S.-W. ( Samsung Electronics Co., Ltd. ) Chung,D.-H. Shin,I.-G. Kim,Y.-H. Choi,S.-W. Han,W.-S. Sohn,J.-M. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 762
- Page(to):
- 769
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
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