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ArF step-and-scan system with 0.75 NA for the 0.10-μm node

Author(s):
Vleeming,B. ( ASML )
Heskamp,B.
Bakker,H.
Verstappen,L.
Finders,J.
Stoeten,J.
Borret,R.
Roempp,O.
3 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
634
Page(to):
650
Pages:
17
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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