Patterning 80-nm gates using 248-nm lithography: an approach for 0.13-μm VLSI manufacturing
- Author(s):
- Wang,C.-M. ( United Microelectronics Corp. )
- Lai,C.-W.
- Huang,J.
- Liu,H.-Y.
- Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 452
- Page(to):
- 463
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
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