DRAm lithographic scaling in the sub-130-nm regime

DRAm lithographic scaling in the sub-130-nm regime

Author(s):: Bukofsky,S.J. ( IBM Microelectronics )
Publication title:: Optical Microlithography XIV
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4346
Pub. Year:: 2001
Vol.:: 4346
Pt.:: One of Two Parts
Page(from):: 222
Page(to):: 228
Pages:: 7
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819440327 [0819440329]
Language:: English
Call no.:: P63600/4346
Type:: Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

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