Negative-tone cycloolefin photoresist for 193-nm lithography
- Author(s):
- Fu,S.C. ( National Taiwan Univ. )
- Hsieh,K.H.
- Wang,L.A.
- Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- Two of Two Parts
- Page(from):
- 751
- Page(to):
- 760
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
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