Evaluation of I-line and DUV photoresists for high-density optical disc mastering
- Author(s):
- Tacken,R. ( Toolex International NV )
- Rodenburg,E.C.
- Veer,M.van der
- Vegchel,J.H.van
- Eijmberts,R.
- Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- Two of Two Parts
- Page(from):
- 637
- Page(to):
- 646
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Liquid immersion deep-UV optical disc mastering for high data capacily ROM discs [5966-67]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
WD28 「」 Exposing method of using photoresist mask for high-density optical disk mastering
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Research on control scheme in high-density multiwavelength optical disc mastering
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Comparison of I-line and DUV high-energy implant litho processes [6152-155]
SPIE - The International Society of Optical Engineering |