Characterization of new aromatic polymers for 157-nm photoresist applications
- Author(s):
Fender,N. ( IBM Almaden Research Ctr. ) Brock,P.J. Chau,W. Bangsaruntip,S. Mahorowala,A.P. Wallraff,G.M. Hinsberg,W.D. Larson,C.E. Ito,H. Breyta,G. Burnham,K. Truong,H.D. Lawson,P. Allen,R.D. - Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 417
- Page(to):
- 427
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
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