Resist materials for 157-nm lithography

Resist materials for 157-nm lithography

Author(s):

Toriumi,M. ( Semiconductor Leading edge Technologies, Inc. )

Publication title:

Advances in Resist Technology and Processing XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4345

Pub. Year:

2001

Vol.:

4345

Pt.:

One of Two Parts

Page(from):

371

Page(to):

378

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440310 [0819440310]

Language:

English

Call no.:

P63600/4345

Type:

Conference Proceedings

Details

TDL ID:	ZA00012061
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2001 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.26-2001.02.28

Similar Items:

1 Conference Proceedings Fluoropolymer resists for 157-nm lithography Toriumi, M., Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Itani, T. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Environmental control for lithography with 157-nm exposure Kitano, J., Kiba, Y., Inazawa, K., Miyoshi, S., Watanabe, H., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings 157-nm single-layer resists based on advanced fluorinated polymers Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Toriumi, M., Itani, T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings 157-nm bilayer resist: patterning and etching performance Miyoshi, S., Furukawa, T., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering
3 Conference Proceedings 157-nm Resist Materials Using Main-Chain Fluorinated Polymers Itani, Toshiro, Watanabe, Hiroyuki, Yamazaki, Tamio, Ishikawa, Seichi, Shida, Naomi, Toriumi, Minoru American Chemical Society	9 Conference Proceedings Performances of resists for 157-nm lithography based on monocyclic fluoropolymers Ishikawa, S., Irie, S., Itani, T., Kawaguchi, Y., Yokokoji, O., Kodama, S.-. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Pattern transfer processes for 157-nm lithography Miyoshi, S., Furukawa, T., Watanabe, H., Irie, S., Itani, T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Novel main-chain-fluorinated polymers for 157-nm photoresists Toriumi, M., Koh, M., Ishikawa, T., Kodani, T., Araki, T., Aoyama, H., Yamashita, T., Yamazaki, T., Furukawa, T., Itani, … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography Hagiwara, T., Furukawa, T., Itani, T., Fujii, K., Ishikawa, T., Koh, M., Kodani, T., Moriya, T., Yamashita, T., Araki, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers Yamazaki, T., Furukawa, T., Itani, T., Ishikawa, T., Koh, M., Araki, T., Toriumi, M., Kodani, T., Aoyama, H., Yamashita, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials Ishikawa, T., Kodani, T., Koh, M., Moriya, T., Araki, T., Aoyama, H., Yamashita, T., Toriumi, M., Hagiwara, T., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Synthesis of novel fluorinated norbornene derivatives for 157-nm application Koh, M., Ishikawa, T., Toriumi, M., Araki, T., Yamashita, T., Aoyama, H., Yamazaki, T., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12