CD changes of 193-nm resists during SEM measurement
- Author(s):
Kudo,T. ( Clariant Corp. ) Bae,J.-B. Dammel,R.R. Kim,W.-K. McKenzie,D.S. Rahman,M.D. Padmanaban,M. Ng,W. - Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 179
- Page(to):
- 189
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
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