Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
- Author(s):
Choi,S.-J. ( DongJin Semichem Co., Ltd ) Choi,Y.-J. Kim,Y.-S. Kim,S.-D. Kim,D.-B. Kim,J.-H. Koh,C.-W. Lee,G. Jung,J.-C. Baik,K.-H. - Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 94
- Page(to):
- 105
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
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