"IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
- Author(s):
Kwong,R.W. ( IBM Microelectronics ) Varanasi,P.R. Lawson,M.C. Hughes,T. Jordhamo,G.M. Khojasteh,M. Mahorowala,A.P. Sooriyakumaran,R. Brock,P.J. Larson,C.E. Fenzel-Alexander,D. Truong,H.D. Allen,R.D. - Publication title:
- Advances in Resist Technology and Processing XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4345
- Pub. Year:
- 2001
- Vol.:
- 4345
- Pt.:
- One of Two Parts
- Page(from):
- 50
- Page(to):
- 57
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- Language:
- English
- Call no.:
- P63600/4345
- Type:
- Conference Proceedings
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