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Understanding nonlinear dissolution rates inphotoresists

Author(s):
Burns,S.D. ( Univ. of Texas at Austin )
Gardiner,A.B.
Krukonis,V.J.
Wetmore,P.M.
Lutkenhaus,J.
Schmid,G.M.
Flanagin,L.W.
Willson,C.G.
3 more
Publication title:
Advances in Resist Technology and Processing XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4345
Pub. Year:
2001
Vol.:
4345
Pt.:
One of Two Parts
Page(from):
37
Page(to):
49
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
Language:
English
Call no.:
P63600/4345
Type:
Conference Proceedings

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