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Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor

Author(s):
Hsu,S. ( ASML MaskTools Inc. )
Shi,X.
Socha,R.J.
Chen,J.F.
Yee,J.C.
Anath,M.
Desai,S.
Imamura,P.H.
Sherrill,M.J.
Tseng,Y.C.
Chang,H.A.
Kao,J.F.
Tseng,A.
Liu,W.J.
Lin,A.
Kujten,J.P.
Jacobs,E.
Verhappen,A.
13 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
783
Page(to):
796
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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