Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology
- Author(s):
- Arthur,G.G. ( Rutherford Appleton Lab. )
- Martin,B.
- Wallace,C.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4344
- Pub. Year:
- 2001
- Page(from):
- 644
- Page(to):
- 652
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- Language:
- English
- Call no.:
- P63600/4344
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Manufacture of photomasks for critical layers of sub-half-micron CMOS technology
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Effect of reticle bias on isofocal process performance at sub-half-micron resolution
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Mask error factor and critical dimension budgets for sub-half-micron CMOS processes
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Metric for process optimization on substrates with transparent stacks in optical lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |