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Process development and impurities analysis for the bottom antireflective coating material

Author(s):
Ko,F.-H. ( National Nano Device Labs. )
Chen,H.-L.
Huang,T.-Y.
Cheng,H.-C.
Ko,C.-J.
Chu,T.-C.
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
562
Page(to):
571
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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