Impact and characterization of mask repair on wafer CD uniformity

Impact and characterization of mask repair on wafer CD uniformity

Author(s):

Chang,H.M. ( United Microelectronics Corp. )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4344

Pub. Year:

2001

Page(from):

177

Page(to):

187

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

Language:

English

Call no.:

P63600/4344

Type:

Conference Proceedings

Details

TDL ID:	ZA00012060
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2001 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.26-2001.03.01

Similar Items:

1 Conference Proceedings Automated defect severity analysis for binary and PSM mask defects Cai, L., Chen, J.-H., Tu, L.-H., Chu, B., Chen, N., Fang, T.Y., Shieh, W.B. SPIE-The International Society for Optical Engineering	7 Conference Proceedings MICROROUGHNESS ANALYSIS OF SILICON WAFERS USING ULTRAVIOLET RAMAN MICROSCOPY Wang, J., Tu, H., Liu, B., Zhou, Q., Zhu, W. Electrochemical Society
2 Conference Proceedings Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET Shieh, W.B., Chou, W., Yang, C.-H., Wu, J.K., Chen, N., Yen, S.M., Hsu, T., Tuan, S., Chang, D., Rudzinski, M.W., Wang, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector [5992-06] Huang, J., Peng, L. -H., Chu, C. -W, Bhattackharyya, K., Eynon, B., Mirzaagha, F., Dibiase, T., Son, K., Cheng, J., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Global CD uniformity improvement in mask manufacturing for advanced lithography Chang, S.-M., Chin, C.C., Wang, W.-C., Lu, C.-L., Hsieh, R.-G., Tsay, C.-S., Yen, Y.-S., Chin, S.-C., Lee, H.-C., Liu, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Repeatable mask metrology for next-generation lithography tools Hentschel,S.L., Kamberian,H., Kovatch,J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Impact of attenuated PSM repair for 130-nm polygate lithography process Shi,X., Hsu,S., Socha,R.J., Chen,J.F., Cheng,A., Su,C., Cheng,J., Chen,A., Lin,H., Wang,D., Chen,D., Lin,A., Conley,W., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Impact of mask CD error on wafer CD error at low-k1 photolithography Kim, B. -G., Choi, S. -W., Choi, J. -H., Chun, C. -U., Yoon, H. -S., Sohn, J. -M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Composition and Dielectric Properties of Ba₂Ti₉O₂₀-BaFe₁₂O₁₉ Ceramics W.B. Zhang, H.T. Yu, J.S. Liu, L.H. Cao Trans Tech Publications
6 Conference Proceedings MICROROUGHNESS ANALYSIS OF SILICON WAFERS USING ULTRAVIOLET RAMAN MICROSCOPY Wang, J., Tu, H., Liu, B., Zhou, Q., Zhu, W. Electrochemical Society	12 Conference Proceedings Wafer shape compensation at the track PEB for improved CD uniformity T. Michaelson, J. Dai, L. Chen, H. Cervera, B. Lue Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12