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Chemical mechanical planarization process induced within lot overlay variation in 0.20-μm DRAM: solution and simulation model

Author(s):
Publication title:
Metrology, Inspection, and Process Control for Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4344
Pub. Year:
2001
Page(from):
89
Page(to):
97
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
Language:
English
Call no.:
P63600/4344
Type:
Conference Proceedings

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