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Mix and match of nanoimprint and UV lithography

Author(s):
Reuther,F. ( micro resist technology GmbH )
Pfeiffer,K.
Fink,M.
Gruetzner,G.
Schulz,H.
Scheer,H.-C.
Gaboriau,F.
Cardinaud,C.
3 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
802
Page(to):
809
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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