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Chemically amplified deep UV resists for electron-beam lithography applications

Author(s):
Chen,H.L. ( National Nano Device Lab. )
Hsu,C.K.
Chen,B.C.
Ko,F.H.
Yang,J.Y.
Huang,T.Y.
Chu,T.C.
2 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
781
Page(to):
788
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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