Compact Z-pinch EUV source for photolithography
- Author(s):
Schriever,G. ( Lambda Physik AG ) Rahe,M. Stamm,U. Basting,D. Khristoforov,O.B. Vinokhodov,A. Borisov,V.M. - Publication title:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4343
- Pub. Year:
- 2001
- Page(from):
- 615
- Page(to):
- 620
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- Language:
- English
- Call no.:
- P63600/4343
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Theoretical and experimental investigations of the 1-kW XeCl laser with UV pre-ionization
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Recent advances in the development of coherent and incoherent UV and EUV discharge sources
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Status report on EUV source development and EUV source applications in EUVL
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Extreme ultraviolet light generation based on laser-produced plasmas(LPP)and gas-discharge-based pinch plasmas:a comparison of different concepts
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |