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Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography

Author(s):
Vogt,U. ( Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy )
Stiel,H.
Will,I.
Wieland,M.
Wilhein,T.
Nickles,P.V.
Sandner,W.
2 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
535
Page(to):
542
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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