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High-accuracy aerial image measurement for electron-beam projection lithography

Author(s):
Yahiro,T. ( Nikon Corp. )
Hirayanagi,N.
Morita,K.
Irita,T.
Yamamoto,H.
Suzuki,S.
Shimizu,H.
Kawata,S.
Okino,T.
Suzuki,K.
5 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
483
Page(to):
490
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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