Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication
- Author(s):
Watanabe,H. ( Association of Super-Advanced Electronics Technologies ) Nakayama,Y. Tsuboi,S. Ezaki,M. Aoyama,H. Matsui,Y. Morosawa,T. Oda,M. - Publication title:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4343
- Pub. Year:
- 2001
- Page(from):
- 323
- Page(to):
- 333
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- Language:
- English
- Call no.:
- P63600/4343
- Type:
- Conference Proceedings
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