Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
- Author(s):
Mahorowala,A.P. ( IBM Thomas J. Watson Research Ctr. ) Babich,K. Petrillo,K.E. Simons,J.P. Angelopoulos,M. Patel,V. Grill,A. Halle,S. Conti,R. Wu,C.-H.J. Wise,R. Chen,L. Thomas,A.C. Lee,B. - Publication title:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4343
- Pub. Year:
- 2001
- Page(from):
- 306
- Page(to):
- 316
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- Language:
- English
- Call no.:
- P63600/4343
- Type:
- Conference Proceedings
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