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Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography

Author(s):
Fiedorowicz,H. ( Military Univ. of Technology )
Bartnik,A.
Daido,H.
Jarocki,R.
Rakowski,R.
Suzuki,M.
Szczurek,M.
Yamagami,S.
3 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
193
Page(to):
202
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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