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Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools

Author(s):
Stenkamp,D. ( Carl Zeiss Lithos GmbH )
Kienzle,O.
Orchowski,A.
Rau,W.D.
Weickenmeier,A.
Benner,G.
Wetzke,M.
Waskiewicz,W.K.
Katsap,V.
Zhu,X.
Liu,H.
Munro,E.
Rouse,J.A.
8 more
Publication title:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4343
Pub. Year:
2001
Page(from):
115
Page(to):
125
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
Language:
English
Call no.:
P63600/4343
Type:
Conference Proceedings

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