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Measurement and analysis of reticle and wafer-level contributions to total CD variation

Author(s):
Publication title:
Microlithographic Techniques in Integrated Circuit Fabrication II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4226
Pub. Year:
2000
Page(from):
169
Page(to):
177
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438980 [0819438987]
Language:
English
Call no.:
P63600/4226
Type:
Conference Proceedings

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