Blank Cover Image

Dense plasma focus radiation source for microlithography and micromachining

Author(s):
Publication title:
Microlithographic Techniques in Integrated Circuit Fabrication II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4226
Pub. Year:
2000
Page(from):
151
Page(to):
159
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438980 [0819438987]
Language:
English
Call no.:
P63600/4226
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Interferometry measurement of laser-induced plasma density and improvement

Zheng,B., Lee,P.C.K.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Video traffic analysis in a multimedia communication network

R.W.L. Cheung, P.C.K. Liu, M.S. Demokan

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Lithography using a compact plasma focus electron source

Lee,P., Feng,X., Zhang,G.X., Liu,M.H., Lee,S.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Optimization of a dense plasma focus device as a light source for EUV lithography

Fomenkov, I.V., Partlo, W.N., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Compact plasma focus soft x-ray source with high repetition rate and high intensity (Invited paper)

Lee,S., Lee,P., Zhang,G.X., Feng,X., Serban,A., Liu,M.H., Wong,T.K.S., Selvam,C., Thang,A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Bauer, B.S., Esaulov, A., Makhin, V., Mancini, R.C., Paraschiv, I., Presura, R., Lindemuth, I.R., Sheehey, P.T., Rice, …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Preliminary results on x-ray lithography using a compact plasma focus

Lee,S., Feng,X., Zhang,G.X., Lee,P., Liu,M.H., Serban,A., Springham,S.V., Wong,T.K.S., Wira,K., Selvam,C., Thang,A.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Direct Synthesis of L1₀-Phase Nanostructured CoPt Thin Films Using Dense Plasma Focus Device Operating in Non-Optimized Focus Mode

Zhenying Pan, Rajdeep S. Rawat, Jiaji Lin, Shumaila Karamat, Paul C.K. Lee, Stuart V. Springham, Augustine T.L. Tan

Materials Research Society
5 Conference Proceedings Performance and scaling of a dense plasma focus light source for EUV lithography

Fomenkov, I.V., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R., Rettig, C.L., Hoffman, J.R.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Shedding Light on the Bioavailability of Organic Pollutants

A. Keane, S. Ghoshal, P. Phoenix, P.C.K. Lau

Springer
6 Conference Proceedings Performance and scaling of a dense plasma focus light source for EUV lithography

Fomenkov, I.V., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R., Rettig, C.L., Hoffman, J.R.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Synchrotron light source and microlithography in Hefei National Synchrotron Radiation Laboratory

Guo, C., Huang, S., Zhou, Y., Qian, S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12