Hardmask/BARC materials for 157-nm lithography

Hardmask/BARC materials for 157-nm lithography

Author(s):

Kim,W.D.

Publication title:

Microlithographic Techniques in Integrated Circuit Fabrication II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4226

Pub. Year:

2000

Page(from):

93

Page(to):

106

Pages:

14

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438980 [0819438987]

Language:

English

Call no.:

P63600/4226

Type:

Conference Proceedings

Details

TDL ID:	ZA00011945
Series ID:	PA00000029
Conf. info. (Name):	Microlithographic techniques in integrated circuit fabrication
Conf. info. (Number):	2000 : 2nd
Conf. info. (Venue):	Singapore
Conf. info. (Date):	2000.11.28-2000.11.30

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