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Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy

Author(s):
Wasson,J.R.
Mangat,P.J.S.
Slaughter,J.M.
Hector,S.D.
Bajt,S.
Kearney,P.A.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
688
Page(to):
696
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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