Blank Cover Image

Investigating inspectability and printability of contamination deposited during SEM analysis

Author(s):
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
654
Page(to):
662
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Defect printability in CPL mask technology

Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Simulation of x-ray mask defect printability

Bollepalli,B.S., Hector,S.D., Maldonado,J.R., Leavey,J.A., Cerrina,F., Khan,M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Application of critical shape analyses to two-dimensional patterns

Pochkowski,M., Mack,C.A., Kasprowicz,B.S.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Influence of e-beam-induced contamination on the printability of resist structures at 157-nm exposure

Schilz,C.M., Eisner,K., Hien,S., Schleussner,T., Ludwig,R., Semmler,A.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer

Kasprowicz,B.S., Eynon,B.G., Morrison,T.B., Wang,C.-Y.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings New photomask substrate for improved lithography performance

Kasprowicz, B.S., Priestley, R., Heslin, M.R., Fladd, D.R.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Comparison of 2D measurement methodologies and their viability in a manufacturing environment

Kasprowicz,B.S., Taylor,D., Hathorn,M.E.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Defect dispositiong using mask printability analysis on alternating phase-shifting masks

Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Evaluation of new mask materials for improved lithography performance

Kasprowicz,B.S., Priestley,R.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Reticle OPC defect printability and detectability for 180-nm technology

Rudzinski, M. W., Zurbrick, L. S., Pettibone, D. W., Ananth, M.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement

Wu,C.-H.J., Huang,W.-S., Chen,K.-J.R., Archie,C.N., Lagus,M.E.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Techniques to inspect SCALPEL masks

Taylor,D., Howard,W.B., Kasica,R.J., Farrow,R.C., Novembre,A.E., Caminos,C., Knurek,C.S.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12