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Evaluation of loading effect of NLD dry etching: ？

Author(s):
Fujisawa,T.
Iwamatsu,T.
Hiruta,K.
Morimoto,H.
Harashima,N.
Sasaki,T.
Hara,M.
Yamashiro,K.
Ohkubo,Y.
Takehana,Y.
5 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
549
Page(to):
552
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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