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Localized resist heating due to electron-beam patterning during photomask fabrication

Author(s):
Wei,A.C.
Beckman,W.A.
Engelstad,R.L.
Mitchell,J.W.
Phung,T.N.
Zheng,J.-F.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
482
Page(to):
493
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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