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Effect of beam blur in mask fabrication

Author(s):
Yang,S.-H.
Ki,W.-T.
Moon,S.-Y.
Jeong,T.-M.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
2 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
468
Page(to):
473
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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