Impact of alternating phase-shift mask quality on 100-nm gate lithography
- Author(s):
- Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 423
- Page(to):
- 432
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Optimization of alternating phase-shift mask structure for ArF laser lithography
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Defect printability analysis on alternating phase-shifting masks for 193-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Challenges of 50-nm gate process in alternating phase shifting lithography
SPIE-The International Society for Optical Engineering |