Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
- Author(s):
Ham,Y.-M. Kim,S.-M. Kim,S.-J. Bae,S.-M. Kim,Y.-D. Baik,K.-H. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 359
- Page(to):
- 371
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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