Blank Cover Image

Proximity effects in alternating aperture phase-shifting masks

Author(s):
Pierrat,C.  
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
325
Page(to):
335
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Proximity effects of alternating phase-shift masks

Maurer,W., Friedrich,C., Mader,L., Thiele,J.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Investigation on micro-trench formation of alternating aperture phase shift masks

Kwon, S.-W., Jeong, H.-S., Kim, L.-J., Ahn, C.-N., Kim, H.-S.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Applicability of alternating phase shifting masks using polarized light [6154-164]

Bubke, K., Sczyrba, M., Pierrat, C

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Printability of topography in alternating aperture phase-shift masks

Philipsen, V.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings New alternating phase-shifting mask conversion methodology using phase conflict resolution

Pierrat, C., Cote, M.L., Patterson, K.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks

Miller, K., Todd, B., Pinkerton, T.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings The Impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process

Cheng, M., Ho, B.C.P., Guenther, D.E.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Optimizing etch uniformity for alternating aperture phase-shift masks on Etec Systems Tetra photomask etch system

Waheed, N.L., Brooks, C.B.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Integration of alternating phase-shift mask technology into optical proximity correction

Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Quartz etch process for alternating aperture phase shift masks (alt-APSM) [5853-20]

Srinivasan, S., Westerman, R., Plumhoff, J., Johnson, D., Constantine, C.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Full phase-shifting methodology for 65-nm-node lithography

Pierrat, C.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Phase-defocus windows for alternating phase-shifting mask

Liang, F. -J., Chen, C. -K., Shin, J. -J., You, J. -W., Lin, C. -H., Pan, Z. -Y., Shu, K. -C., Gau, T. -S., Lin, B. J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12