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Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography

Author(s):
Ii,T.
Saga,T.
Hattori,Y.
Ohshima,T.
Otaki,M.
Iwakata,M.
Haraguchi,T.
Kanayama,K.
Yamazaki,T.
Fukuhara,N.
Matsuo,T.
6 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
297
Page(to):
308
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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