KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process
- Author(s):
Kim,J. Kim,S.-C. Kim,H.-C. Lee,S.-I. Choi,Y.-K. Ham,Y.-M. Han,O. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 287
- Page(to):
- 296
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Detectability and printability of programmed defect reticle for 256-Mb dram
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |