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Chrome dry etch process characterization using surface nanoprofiling

Author(s):
Ruhl,G.G.
Dietrich,R.
Ludwig,R.
Falk,N.
Morrison,T.B.
Stoehr,B.C.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
97
Page(to):
107
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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