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Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japan 2000 Best Presentation Award)

Author(s):
Suda,H.
Mitsui,H.
Nozawa,O.
Ohtsuka,H.
Takeuchi,M.
Nishida,N.
Ohkubo,Y.
Ushida,M.
3 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
58
Page(to):
72
Pages:
15
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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