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Lithographic performance results for a new 50-kV electron-beam mask writer

Author(s):
Chakarian,V.
Bylciw,S.R.
Sauer,C.A.
Trost,D.
Zywno,M.
Teitzel,R.
Raymond Ⅲ,F.
Abboud,F.E.
3 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
1
Page(to):
15
Pages:
15
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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