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Prospective technology for system-on-a-chip: N2 implant followed by VHP O2 reoxidation

Author(s):
Luo,T.Y.
Al-Shareef,H.N.
Brown,G.A.
Watt,V.H.C.
Karamcheti,A.
Jackson,M.D.
Huff,H.R.
Evans,B.
Lee,C.H.
Luan,H.F.
Kwong,D.L.
6 more
Publication title:
Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4181
Pub. Year:
2000
Page(from):
271
Page(to):
280
Pages:
10
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438423 [0819438421]
Language:
English
Call no.:
P63600/4181
Type:
Conference Proceedings

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