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Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Author(s):
Deleporte,A.G.
Allgair,J.
Archie,C.N.
Banke,G.W.
Postek,M.T.
Schlesinger,J.E.
Vladar,A.E.
Yanof,A.W.
3 more
Publication title:
Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4181
Pub. Year:
2000
Page(from):
42
Page(to):
57
Pages:
16
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438423 [0819438421]
Language:
English
Call no.:
P63600/4181
Type:
Conference Proceedings

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