Extreme-ultraviolet source development: a comparison of different concepts

Extreme-ultraviolet source development: a comparison of different concepts

Author(s):

Publication title:

Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4146

Pub. Year:

2000

Page(from):

113

Page(to):

120

Pages:

8

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819437914 [0819437913]

Language:

English

Call no.:

P63600/4146

Type:

Conference Proceedings

Details

TDL ID:	ZA00011871
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Soft X-Ray and EUV Imaging Systems
Conf. info. (Number):	2000
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2000.08.03-2000.08.04

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