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Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas

Author(s):
Publication title:
Instrumentation for UV/EUV astronomy and solar missions :30 July- 1 August 2000 San Diego, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4139
Pub. Year:
2000
Page(from):
59
Page(to):
69
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437846 [0819437840]
Language:
English
Call no.:
P63600/4139
Type:
Conference Proceedings

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