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New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Author(s):
Publication title:
Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4099
Pub. Year:
2000
Page(from):
206
Page(to):
217
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437440 [0819437441]
Language:
English
Call no.:
P63600/4099
Type:
Conference Proceedings

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