High-repetition-rate ArF excimer laser for microlithography
- Author(s):
Wakabayashi,O. Enami,T. Ishii,K. Terashima,K. Itakura,Y. Watanabe,T. Ohta,T. Ohbu,A. Kubo,H. Tanaka,H. Andou,S. Matsunga,T. Umeda,H. Suzuki,T. Sumitani,A. Mizoguchi,H. - Publication title:
- First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4088
- Pub. Year:
- 2000
- Page(from):
- 191
- Page(to):
- 194
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437310 [081943731X]
- Language:
- English
- Call no.:
- P63600/4088
- Type:
- Conference Proceedings
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